Photoconductivity of MOCVD CdS thin films
| dc.contributor.author | Eleruja, Marcus Adebola | |
| dc.contributor.author | Adedeji, A.U | |
| dc.contributor.author | Azi, samuel | |
| dc.contributor.author | Okulaja, Oluwabukola | |
| dc.date.accessioned | 2023-05-13T17:50:52Z | |
| dc.date.available | 2023-05-13T17:50:52Z | |
| dc.date.issued | 1995-01 | |
| dc.description | International Journal of Materials Science Letters Vol.14 No16 p.1158-1160 | en_US |
| dc.description.abstract | ... [2,3,4] Many techniques have been reported in deposition of CdS thin films. These include evaporation, sputtering, spray pyrolysis, molecular beam epitaxy (MBE) technique, photochemical deposition, successive ionic layer adsorption and reaction (SILAR) method [5][6][7][8][9][10][11][12].In all of these deposition methods there are some problems in each of them, for example , it is difficult to obtain a stiochiometric CdS films by evaporation technique and a high substrate temperature is required in spray deposition. [13] The chemical bath deposition (CBD) method appears to be a relatively simple, in expansion method to prepare a homogenous films with controlled composition [14]. ... | en_US |
| dc.identifier.other | DOI: 10.1007/BF00423391 | |
| dc.identifier.uri | https://ir.oauife.edu.ng/123456789/5507 | |
| dc.language.iso | en | en_US |
| dc.publisher | Journal of Materials Science Letters | en_US |
| dc.subject | spray pyrolysis | en_US |
| dc.subject | stiochiometric CdS films | en_US |
| dc.subject | successive ionic layer adsorption | en_US |
| dc.subject | photochemical deposition | en_US |
| dc.subject | molecular beam epitaxy (MBE) technique | en_US |
| dc.title | Photoconductivity of MOCVD CdS thin films | en_US |
| dc.type | Journal | en_US |