Oxidation-induced changes in the electro-optical properties of thin copper films
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Date
1989-07
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Journal ISSN
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Publisher
Il Nuovo Cimento D
Abstract
The room temperature oxidation of vapour deposited copper films has been investigated as a function of film thickness and time by the sheet resistance and optical transmittance measurements. An increase of both sheet resistance and transmittance with a tendency to saturation has been observed. Time variation of the sheet resistance shows that the kinetics of oxidation could be described by a model whereby an initial logarithmic oxide growth changes to an inverse logarithmic one as time progresses; the thicker the film, the longer the change-over time. Absorption coefficients of oxidized films show that the resulting oxide is most probably Cu2O. Evaluation of the oxidized films for possible use as transparent electrode material shows the existence of an optimum thickness value
Description
International journa ll Nuovo Cimento Volume D 1 No7 Pg:969-979
Keywords
transparent electrode material, temperature oxidation, transmittance measurements, the kinetics of oxidation, inverse logarithmic