Statistics for Deep level transient spectroscopy study of the damage induced in n-type silicon by a gate oxide etching in a CHF3/Ar plasma
Total visits
| views | |
|---|---|
| Deep level transient spectroscopy study of the damage induced in n-type silicon by a gate oxide etching in a CHF3/Ar plasma | 3 |
Total visits per month
| views | |
|---|---|
| February 2024 | 0 |
| March 2024 | 0 |
| April 2024 | 0 |
| May 2024 | 0 |
| June 2024 | 0 |
| July 2024 | 0 |
| August 2024 | 0 |
File Visits
| views | |
|---|---|
| citation-224467564.txt | 6 |