Preparation and characterization of MOCVD thin films of indium tin oxide

dc.contributor.authorAkinwunmi, O.O
dc.contributor.authorEleruja, Marcus Adebola
dc.contributor.authorOlowolafe, J.O
dc.contributor.authorAdegboyega, G.A
dc.date.accessioned2023-05-13T17:53:38Z
dc.date.available2023-05-13T17:53:38Z
dc.date.issued1999-11
dc.descriptionInternational journal Optical Materials Vol13,No2,p.255-259en_US
dc.description.abstractIndium Tin Oxide (ITO) was deposited by pyrolysis of mixed metal acetylacetonate (a single solid-source precursor). This study demonstrates that the properties of the as-deposited film depend on the deposition temperature. Films with a resistivity of , a visible transmission of over 80%, and a direct optical energy gap of 3.76 eV were deposited.en_US
dc.identifier.otherDOI: 10.1016/S0925-3467(98)00089-5
dc.identifier.urihttps://ir.oauife.edu.ng/123456789/5528
dc.language.isoenen_US
dc.publisherOptical Materialsen_US
dc.subjectmetal acetylacetonateen_US
dc.subjecta visible transmissionen_US
dc.subjecta direct optical energy gapen_US
dc.subjectMOCVD thin filmsen_US
dc.subjectindium tin oxideen_US
dc.titlePreparation and characterization of MOCVD thin films of indium tin oxideen_US
dc.typeJournalen_US
Files
Original bundle
Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
citation-222773590 (1).txt
Size:
572 B
Format:
Plain Text
Description:
jonarnal atircle
License bundle
Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed upon to submission
Description:
Collections